Fundamentals of Semiconductor Fabrication

Informationen zum Autor Gary S. May, Ph.D. is Executive Assistant to the President and Motorola Foundation Professor of Microelectronics in the School of Electrical and Computer Engineering at the Georgia Institute of Technology. Dr. May was a national Science Foundation national Young Investigator, Georgia Tech's Outstanding Young Alumnus, received Georgia Tech's Outstanding Service Award, and was named a Giant of Science by the Quality Education for Minorities network in 2001. He was a member of the NSF Engineering Advisory Committee, served on and chaired the NSF Committee for Equal Opportunity in Science and Engineering, and was Editor-in-Chief for IEEE Transactions of Semiconductor Manufacturing from 1997 to 2001. Dr. May currently serves as chair of the National Advisory Board for the National Society of Black Engineers.Simon M. Sze, Ph.D. is UMC Chair Professor of National Chiao Tung University, and President of the National Nano Device Laboratories. He has received the IEEE Ebers Award, the Sun Yet-sen Award, the National Science and Technology Award, and the National Chair Professor Award. He is a Life Fellow of IEEE, a member of the Academia Sinica, the Chinese Academy of Engineering, and the US National Academy of Engineering. He has authored or coauthored over 150 technical papers, and has written, edited, and contributed to 24 books. His book Physics of Semiconductor Devices (Wiley 1969, 2nd Ed, 1981) is the most cited work in contemporary engineering and applied science publications (over 12,000 citations from ISI Press). Klappentext This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition.* The book integrates Computer Modeling & Simulation tools throughout.* Process simulation is used as a tool for what-if analysis and discussion.* Comprehensive coverage of process sequences helps readers connect individual steps into a cohesive whole. Zusammenfassung Fundamentals of Semiconductor Fabrication provides an introduction to semiconductor fabrication technology, from crystal growth to integrated devices and circuits. It includes theoretical and practical aspects of all major fabrication steps, making it a useful reference tool when students enter the semiconductor industry. Each chapter begins with an introduction and a list of learning goals, and each chapter ends with a summary of important concepts and suggested homework problems. Inhaltsverzeichnis * Introduction* Crystal Growth* Silicon Oxidation* Photolithography* Etching* Diffusion* Ion Implantation* Film Deposition* Process Integration* IC Manufacturing* Future Trends and ChallengesAppendix A: List of SymbolsAppendix B: International System of UnitsAppendix C: Unit PrefixesAppendix D: Greek AlphabetAppendix E: Physical ConstantsAppendix F: Properties of Si and GaAs at 300KAppendix G: Properties of the Error FunctionAppendix H: Basic Kinetic Theory of GasAppendix I: SUPREM CommandsAppendix J: Percentage Points of the t DistributionAppendix K: Percentage Points of the F Distribution...

Autorentext
Gary S. May, Ph.D. is Executive Assistant to the President and Motorola Foundation Professor of Microelectronics in the School of Electrical and Computer Engineering at the Georgia Institute of Technology. Dr. May was a national Science Foundation national Young Investigator, Georgia Tech's Outstanding Young Alumnus, received Georgia Tech's Outstanding Service Award, and was named a Giant of Science by the Quality Education for Minorities network in 2001. He was a member of the NSF Engineering Advisory Committee, served on and chaired the NSF Committee for Equal Opportunity in Science and Engineering, and was Editor-in-Chief for IEEE Transactions of Semiconductor Manufacturing from 1997 to 2001. Dr. May currently serves as chair of the National Advisory Board for the National Society of Black Engineers. Simon M. Sze, Ph.D. is UMC Chair Professor of National Chiao Tung University, and President of the National Nano Device Laboratories. He has received the IEEE Ebers Award, the Sun Yet-sen Award, the National Science and Technology Award, and the National Chair Professor Award. He is a Life Fellow of IEEE, a member of the Academia Sinica, the Chinese Academy of Engineering, and the US National Academy of Engineering. He has authored or coauthored over 150 technical papers, and has written, edited, and contributed to 24 books. His book Physics of Semiconductor Devices (Wiley 1969, 2nd Ed, 1981) is the most cited work in contemporary engineering and applied science publications (over 12,000 citations from ISI Press).

Klappentext
This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. * The book integrates Computer Modeling & Simulation tools throughout. * Process simulation is used as a tool for what-if analysis and discussion. * Comprehensive coverage of process sequences helps readers connect individual steps into a cohesive whole.

Zusammenfassung
Fundamentals of Semiconductor Fabrication provides an introduction to semiconductor fabrication technology, from crystal growth to integrated devices and circuits. It includes theoretical and practical aspects of all major fabrication steps, making it a useful reference tool when students enter the semiconductor industry. Each chapter begins with an introduction and a list of learning goals, and each chapter ends with a summary of important concepts and suggested homework problems.

Inhalt
* Introduction * Crystal Growth * Silicon Oxidation * Photolithography * Etching * Diffusion * Ion Implantation * Film Deposition * Process Integration * IC Manufacturing * Future Trends and Challenges Appendix A: List of Symbols Appendix B: International System of Units Appendix C: Unit Prefixes Appendix D: Greek Alphabet Appendix E: Physical Constants Appendix F: Properties of Si and GaAs at 300K Appendix G: Properties of the Error Function Appendix H: Basic Kinetic Theory of Gas Appendix I: SUPREM Commands Appendix J: Percentage Points of the t Distribution Appendix K: Percentage Points of the F Distribution

#	Onlineshop	Preis CHF	Versand CHF	Total CHF
1	Seller	0.00	0.00	0.00